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Effect of electron blocking layers on the conduction and valence band profiles of InGaN/GaN LEDs

机译:电子阻挡层对InGaN / GaN LED导带和价带分布的影响

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摘要

In this paper we investigate the effect of including an electron blocking layer between the quantum well active region and the p-type layers of a light emitting diode has on the conduction and valence band profile of a light emitting diode. Two light emitting diode structures with nominally identical quantum well active regions one containing an electron blocking layer and one without were grown for the purposes of this investigation. The conduction and valence band profiles for both structures were then calculated using a commercially available Schrödinger-Poisson calculator, and a modification to the electric field across the QWs observed. The results of these calculations were then compared to photoluminescence and photoluminescence time decay measurements. The modification in electric field across the quantum wells of the structures resulted in slower radiative recombination in the sample containing an electron blocking layers. The sample containing an electron blocking layer was also found to exhibit a lower internal quantum efficiency, which we attribute to the observed slower radiative recombination lifetime making radiative recombination less competitive. (© 2016 The Authors. Phys. Status Solidi C published by WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)
机译:在本文中,我们研究了在量子阱有源区和发光二极管的p型层之间包含电子阻挡层对发光二极管的导带和价带分布的影响。为了该研究的目的,生长了具有名义上相同的量子阱有源区的两个发光二极管结构,其中一个包含电子阻挡层,一个不包含电子阻挡层。然后,使用市售的Schrödinger-Poisson计算器计算两种结构的导带和价带分布,并观察到整个QW的电场变化。然后将这些计算的结果与光致发光和光致发光时间衰减测量值进行比较。跨结构量子阱的电场变化导致包含电子阻挡层的样品中的辐射复合速度变慢。还发现含有电子阻挡层的样品表现出较低的内部量子效率,这归因于观察到的较慢的辐射复合寿命,从而使辐射复合竞争性降低。 (©2016年,作者:威利-VCH Verlag GmbH&Co. KGaA,魏因海姆出版的《作者的物理状态C》)

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